Atelier Pol: MASK. In Present-Day Art

Published: 10 Jun 2020
Category: Projects

Atelier Pol, a swiss based design studio designed the exhibition catalogue in close collaboration with the Aargauer Kunsthaus. With rich visual material and short texts on the exhibited works, the volume shows the artists' respective approaches to the broad thematic field of the mask. Two introductory essays additionally shed light on the topicality of the mask and its prehistory in art.

Artist index: Kader Attia, Silvia Bächli & Eric Hattan, Sabian Baumann, Nathalie Bissig, Olaf Breuning, Edson Chagas, Hélène Delprat, Cecilia Edefalk, Nicole Eisenman, Theaster Gates, Gauri Gill, Douglas Gordon, Aneta Grzeszykowska, Christoph Hefti, Judith Hopf, Cameron Jamie, Laura Lima, Christian Marclay, Mélodie Mousset, Mike Nelson, Elodie Pong, Pope.L, Ugo Rondinone, Amanda Ross-Ho, Markus Schinwald, Cindy Sherman, Francisco Sierra, Simon Starling, John Stezaker, Rosemarie Trockel, Paloma Varga Weisz, Gillian Wearing, Susanne Weirich, Pedro Wirz, Sislej Xhafa

Publisher: Scheidegger & Spiess
Specs: 24.2 × 32.6 cm, Hardcover with transparent dust jacket, 312 pages, 5 colours, 256 illustrations
Typefaces: Founders Grotesk by Klim Type Foundry, Messina Serif by Luzi Type, Inter UI by Rasmus Andersson

atelier-pol.ch

Atelier Pol: MASK. In Present-Day Art

Atelier Pol: MASK. In Present-Day Art

Atelier Pol: MASK. In Present-Day Art

Atelier Pol: MASK. In Present-Day Art

Atelier Pol: MASK. In Present-Day Art

Atelier Pol: MASK. In Present-Day Art

Atelier Pol: MASK. In Present-Day Art

Atelier Pol: MASK. In Present-Day Art

Atelier Pol: MASK. In Present-Day Art

Atelier Pol: MASK. In Present-Day Art

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